Invention Grant
- Patent Title: Gas sealing skirt for suspended showerhead in process chamber
- Patent Title (中): 用于处理室中的悬浮喷头的气体密封裙
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Application No.: US11552627Application Date: 2006-10-25
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Publication No.: US07641762B2Publication Date: 2010-01-05
- Inventor: Ernst Keller
- Applicant: Ernst Keller
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agent Robert J. Stern
- Main IPC: C23F1/00
- IPC: C23F1/00

Abstract:
Stress within a suspension wall for suspending a showerhead in a process chamber is ameliorated by one or more of: (1) A gas sealing skirt that helps protect the suspension wall from direct contact with process gas. The gas sealing skirt is connected to either the chamber wall or the showerhead but is not connected to both. (2) Openings in the suspension wall that reduce exposure of the suspension wall to process gas or ambient atmosphere when the chamber lid is opened. (3) A substantially vertical arrangement of one or more rifts in the suspension wall which facilitate horizontal buckling or flexing of the suspension wall. (4) A plurality of suspension walls whose respective central portions are coplanar.
Public/Granted literature
- US20080099145A1 GAS SEALING SKIRT FOR SUSPENDED SHOWERHEAD IN PROCESS CHAMBER Public/Granted day:2008-05-01
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