Invention Grant
- Patent Title: Polishing pad and cushion layer for polishing pad
- Patent Title (中): 抛光垫和抛光垫垫层
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Application No.: US11366077Application Date: 2006-03-02
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Publication No.: US07641540B2Publication Date: 2010-01-05
- Inventor: Koichi Ono , Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Masayuki Tsutsumi
- Applicant: Koichi Ono , Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Masayuki Tsutsumi
- Applicant Address: JP Osaka
- Assignee: Toyo Tire & Rubber Co., Ltd
- Current Assignee: Toyo Tire & Rubber Co., Ltd
- Current Assignee Address: JP Osaka
- Agency: Law Office of Katsuhiro Arai
- Priority: JP2000-367468 20001201; JP2000-367469 20001201; JP2001-013405 20010122; JP2001-061221 20010306; JP2001-103699 20010402; JP2001-225568 20010726; JP2001-234577 20010802; JP2001-269928 20010906; JP2001-274011 20010910; JP2001-302939 20010928; JP2001-302940 20010928; JP2001-302941 20010928
- Main IPC: B24D11/00
- IPC: B24D11/00
Abstract:
A polishing pad includes at least a polishing layer and a cushion layer and is characterized in that the difference in hardness in Shore D hardness between the polishing layer and the cushion layer is 3 or more.
Public/Granted literature
- US20060148391A1 Polishing pad and cushion layer for polishing pad Public/Granted day:2006-07-06
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