Invention Grant
- Patent Title: Imprint lithography
- Patent Title (中): 印刷光刻
-
Application No.: US11797357Application Date: 2007-05-02
-
Publication No.: US07641467B2Publication Date: 2010-01-05
- Inventor: Yvonne Wendela Kruijt-Stegeman , Raymond Jacobus Wilhelmus Knaapen , Raymond Wilhelmus Louis Lafarre
- Applicant: Yvonne Wendela Kruijt-Stegeman , Raymond Jacobus Wilhelmus Knaapen , Raymond Wilhelmus Louis Lafarre
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: B29C59/00
- IPC: B29C59/00

Abstract:
An imprint lithography apparatus includes an imprint template operably connected to an imprint actuator. The imprint actuator is actuatable to displace the template along an imprint axis to bring the template into contact with an imprintable medium. The template is connected to the actuator via a bearing configured to permit substantially unrestricted displacement of the actuator relative to the template along an axis substantially perpendicular to the imprint axis during release of the template from the imprintable medium.
Public/Granted literature
- US20080271628A1 Imprint lithography Public/Granted day:2008-11-06
Information query