Invention Grant
- Patent Title: Liquid-jet head, method of manufacturing the same, and liquid-jet apparatus
- Patent Title (中): 喷液头,制造方法和液体喷射装置
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Application No.: US11475129Application Date: 2006-06-27
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Publication No.: US07641324B2Publication Date: 2010-01-05
- Inventor: Masato Shimada
- Applicant: Masato Shimada
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2005-187280 20050627
- Main IPC: B41J2/045
- IPC: B41J2/045

Abstract:
Provided are, a liquid-jet head capable of enhancing durability thereof when it is driven, and of making an arrangement density of piezoelectric elements high-density, a method of manufacturing the same, and a liquid-jet apparatus. The liquid-jet head includes: piezoelectric elements which are provided on a passage-forming substrate with a vibration plate interposed therebetween, and are respectively configured of a lower electrode, piezoelectric layers and upper electrodes, the passage-forming substrate having pressure generating chambers, which communicate with nozzle orifices for ejecting liquid droplets, formed therein, in which, while the lower electrode is continuously provided across plural piezoelectric elements, near-end portions of the lower electrode at least in regions of the lower electrode between adjacent ones of the piezoelectric elements are formed into thin-thickness portions thinner than portions of the lower electrode in other regions of the lower electrode.
Public/Granted literature
- US20060290748A1 Liquid-jet head, method of manufacturing the same, and liquid-jet apparatus Public/Granted day:2006-12-28
Information query
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