Invention Grant
- Patent Title: Vacuum treating device with lidded treatment container
- Patent Title (中): 真空处理装置带盖处理容器
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Application No.: US10544708Application Date: 2004-02-06
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Publication No.: US07640946B2Publication Date: 2010-01-05
- Inventor: Tetsuya Saito
- Applicant: Tetsuya Saito
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2003-029895 20030206
- International Application: PCT/JP2004/001253 WO 20040206
- International Announcement: WO2004/070814 WO 20040819
- Main IPC: F17D1/02
- IPC: F17D1/02

Abstract:
A vacuum treating device, comprising a treatment container having a container body (111) and a lid (112) and allowing an internal pressure to be reduced and a lid support mechanism (130), wherein an upper opening (111a) formed in the container body can be closed airtight by the lid (112). The lid support mechanism (130) opens and closes the upper opening (111a) of the container body by moving the lid (112) so as to be translatingly moved in the vertical direction and, when the lid (112) is moved upward from the container body (111), supports the lid (112) so as to be rotated around a vertical axis disposed around the lid.
Public/Granted literature
- US20060099053A1 Vacuum treating device with lidded treatment container Public/Granted day:2006-05-11
Information query
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