Invention Grant
- Patent Title: Semiconductor integrated circuit device
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Application No.: US17394065Application Date: 2021-08-04
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Publication No.: US12159866B2Publication Date: 2024-12-03
- Inventor: Isaya Sobue
- Applicant: SOCIONEXT INC.
- Applicant Address: JP Kanagawa
- Assignee: SOCIONEXT INC.
- Current Assignee: SOCIONEXT INC.
- Current Assignee Address: JP Kanagawa
- Agency: Rimon P.C.
- Priority: JP2019-048205 20190315
- Main IPC: H01L27/06
- IPC: H01L27/06 ; B82Y10/00 ; H01L21/822 ; H01L21/8238 ; H01L27/092 ; H01L29/06 ; H01L29/08 ; H01L29/423 ; H01L29/775 ; H01L29/786

Abstract:
A layout structure of a capacitive element using a complementary FET (CFET) and having a high breakdown voltage is provided. In the capacitive element, first and second transistors overlap as viewed in plan, and the gates thereof are mutually connected. Third and fourth transistors overlap as viewed in plan, and the gates thereof are mutually connected. Nodes of the first and third transistors are mutually connected through a local interconnect, and nodes of the second and fourth transistors are mutually connected through a local interconnect.
Public/Granted literature
- US20210366902A1 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE Public/Granted day:2021-11-25
Information query
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