Invention Grant
- Patent Title: Semiconductor storage device
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Application No.: US17902725Application Date: 2022-09-02
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Publication No.: US12112807B2Publication Date: 2024-10-08
- Inventor: Mina Hatakeyama
- Applicant: KIOXIA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Kim & Stewart LLP
- Priority: JP 22047651 2022.03.23
- Main IPC: G11C16/14
- IPC: G11C16/14 ; G11C16/26

Abstract:
A semiconductor storage device includes a circuit, a first plurality of conductive layers arranged along a first direction, extending along a second direction, and including first through third layers, the first layer between the second and third layers, a second plurality of conductive layers including fourth through sixth layers corresponding to the first through third layers and separated therefrom, a semiconductor layer extending between the first and second pluralities, and a charge storage layer between the semiconductor layer and the first and second pluralities. The circuit applies, in a verification operation of a write operation on the first conductive layer, a verification voltage to the first layer, a voltage smaller than the verification voltage to the fourth layer, a read voltage larger than the verification voltage to the second and fifth conductive layers, and a second voltage smaller than the read voltage to the third or sixth conductive layer.
Public/Granted literature
- US20230307059A1 SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2023-09-28
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