Invention Grant
- Patent Title: High-temperature bimetal
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Application No.: US17513014Application Date: 2021-10-28
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Publication No.: US12027234B2Publication Date: 2024-07-02
- Inventor: Yoshimitsu Oda , Masaaki Ishio
- Applicant: HITACHI METALS, LTD.
- Applicant Address: JP Tokyo
- Assignee: PROTERIAL, LTD.
- Current Assignee: PROTERIAL, LTD.
- Current Assignee Address: JP Tokyo
- Agency: WHDA, LLP
- Priority: JP 09140040 2009.06.11
- The original application number of the division: US13375167
- Main IPC: G12B1/02
- IPC: G12B1/02 ; B32B15/01 ; C22C38/08 ; C22C38/12 ; C22C38/40

Abstract:
A high-temperature bimetal capable of being inhibited from considerably shifting from an original position when the temperature has fallen to an ordinary temperature is provided. This high-temperature bimetal (1) includes a high thermal expansion layer (2) made of austenitic stainless steel and a low thermal expansion layer (3) made of a thermosensitive magnetic metal having a Curie point and bonded to the high thermal expansion layer. The high-temperature bimetal is employed over both a high temperature range of not less than the Curie point and a low temperature range of less than the Curie point, while an upper limit of operating temperatures in the high temperature range of not less than the Curie point is at least 500° C.
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