Invention Grant
- Patent Title: Transistor, method of manufacturing transistor, and display device using the same
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Application No.: US17572789Application Date: 2022-01-11
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Publication No.: US11929439B2Publication Date: 2024-03-12
- Inventor: Sakae Tanaka
- Applicant: Mikuni Electron Corporation
- Applicant Address: JP Saitama
- Assignee: MIKUNI ELECTRON CORPORATION
- Current Assignee: MIKUNI ELECTRON CORPORATION
- Current Assignee Address: JP Saitama
- Agency: PEARNE & GORDON LLP
- Priority: JP 18180487 2018.09.26
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L21/02 ; H01L27/12 ; H01L29/24 ; H01L29/423 ; H01L29/66 ; H10K59/121 ; H10K59/124 ; H10K59/12

Abstract:
A transistor in an embodiment includes an oxide semiconductor layer on a substrate, the oxide semiconductor layer including a first region and a second region, a first gate electrode including a region overlapping the oxide semiconductor layer, the first gate electrode being arranged on a surface of the oxide semiconductor layer opposite to the substrate, a first insulating layer between the first gate electrode and the oxide semiconductor layer, and a first oxide conductive layer and a second oxide conductive layer between the oxide semiconductor layer and the substrate, the first oxide conductive layer and the second oxide conductive layer each including a region in contact with the oxide semiconductor layer.
Public/Granted literature
- US11888072B2 Transistor, method of manufacturing transistor, and display device using the same Public/Granted day:2024-01-30
Information query
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