A semiconductor memory device includes first conductive layers, second conductive layers, a first semiconductor layer, a charge storage layer, and a first wiring. The semiconductor memory device is configured to execute an erase operation including a first and a second erase loop. In the first erase loop, the semiconductor memory device applies a first voltage to at least a part of the first conductive layers and at least a part of the second conductive layers and applies an erase voltage larger than the first voltage to the first wiring. In the second erase loop, the semiconductor memory device applies the first voltage to at least a part of the first conductive layers, applies a second voltage larger than the first voltage to at least apart of the second conductive layers, and applies the erase voltage to the first wiring.