Invention Grant
- Patent Title: Method of forming an electrical metal contact and method of producing a vertical cavity surface emitting laser
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Application No.: US17204004Application Date: 2021-03-17
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Publication No.: US11862933B2Publication Date: 2024-01-02
- Inventor: Roman Koerner , Alexander Weigl
- Applicant: TRUMPF Photonic Components GmbH
- Applicant Address: DE Ulm
- Assignee: TRUMPF PHOTONIC COMPONENTS GMBH
- Current Assignee: TRUMPF PHOTONIC COMPONENTS GMBH
- Current Assignee Address: DE Ulm
- Agency: LEYDIG, VOIT & MAYER, LTD.
- Priority: EP 164475 2020.03.20
- Main IPC: H01S5/183
- IPC: H01S5/183 ; H01S5/042

Abstract:
A method of forming an electrical metal contact within a semiconductor layer stack of a vertical cavity surface emitting laser includes forming a contact hole into the semiconductor layer stack. The contact hole has a bottom and a side wall extending from the bottom. The method further includes providing a photoresist mask inside the contact hole. The photoresist mask covers the side wall of the contact hole and has an opening extending to the bottom of the contact hole. The method additionally includes wet-chemical isotropic etching the bottom of the contact hole, depositing a metal on the bottom of the contact hole, and removing the photoresist mask so that the metal on the bottom of the contact hole is left as the electrical metal contact.
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