Invention Grant
- Patent Title: Semiconductor wafer thinned by stealth lasing
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Application No.: US18128622Application Date: 2023-03-30
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Publication No.: US11862583B2Publication Date: 2024-01-02
- Inventor: Chee Keong Loh , Foo You Chow , Ridzuan Hanapi , Boon Soo Lim
- Applicant: Western Digital Technologies, Inc.
- Applicant Address: US CA San Jose
- Assignee: Western Digital Technologies, Inc.
- Current Assignee: Western Digital Technologies, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Vierra Magen Marcus LLP
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L21/78 ; H01L21/304 ; H01L21/268

Abstract:
A semiconductor wafer thinned by a stealth lasing process, and semiconductor dies formed therefrom. After formation of an integrated circuit layer on a semiconductor wafer, the wafer may be thinned by focusing a laser at discrete points in the wafer substrate beneath the surface of the wafer. Upon completion of stealth lasing in one or more planar layers in the substrate, a portion of the substrate may be removed, leaving the wafer thinned to a desired final thickness.
Public/Granted literature
- US20230238338A1 SEMICONDUCTOR WAFER THINNED BY STEALTH LASING Public/Granted day:2023-07-27
Information query
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