Invention Grant
- Patent Title: Thermal substrate contact
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Application No.: US17122749Application Date: 2020-12-15
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Publication No.: US11862527B2Publication Date: 2024-01-02
- Inventor: Jian Wu , Feng Han , Shuai Zhang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. , TSMC CHINA COMPANY, LIMITED
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.,TSMC CHINA COMPANY, LIMITED
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.,TSMC CHINA COMPANY, LIMITED
- Current Assignee Address: TW Hsinchu; CN Shanghai
- Agency: Hauptman Ham, LLP
- Priority: CN 2011306929.9 2020.11.20
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L23/36 ; H01L21/48 ; H01L27/12

Abstract:
An integrated circuit includes an oxide layer over a substrate; a layer of semiconductor material over the oxide layer and which includes a P-well, an N-well, and a channel of a transistor; and a thermal substrate contact extending through the layer of semiconductor material and the oxide layer, and against a top surface of the substrate. A thermal substrate contact increases the ability to remove heat produced from the integrated circuit transistors out of the integrated circuit. A thermal substrate contact which traverses the oxide layer over a substrate provides a secondary path for heat out of an integrated circuit (or, alternatively, out of a substrate through the integrated circuit) to cool the integrated circuit.
Public/Granted literature
- US20220165637A1 THERMAL SUBSTRATE CONTACT Public/Granted day:2022-05-26
Information query
IPC分类: