Invention Grant
- Patent Title: Substrate stage
-
Application No.: US16842219Application Date: 2020-04-07
-
Publication No.: US11862488B2Publication Date: 2024-01-02
- Inventor: Masamichi Hara , Yasuyuki Kagaya
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Venjuris, P.C.
- Priority: JP 19079909 2019.04.19
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/683
Abstract:
A substrate stage includes: a stage body having a substrate placing surface on which a substrate is placed in a processing apparatus that performs a processing on the substrate; and a thermocouple configured to detect a temperature near the substrate placing surface of the stage body. The thermocouple includes a temperature measuring unit formed by stacking a first metal film and a second metal film, on a surface on a side of the substrate placing surface of the stage body.
Public/Granted literature
- US20200335365A1 SUBSTRATE STAGE Public/Granted day:2020-10-22
Information query
IPC分类:
