Invention Grant
- Patent Title: Plasma control system and plasma control program
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Application No.: US17625775Application Date: 2020-07-10
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Publication No.: US11862431B2Publication Date: 2024-01-02
- Inventor: Tsubasa Iwakoke , Shigeaki Kishida
- Applicant: NISSIN ELECTRIC CO., LTD.
- Applicant Address: JP Kyoto
- Assignee: NISSIN ELECTRIC CO., LTD.
- Current Assignee: NISSIN ELECTRIC CO., LTD.
- Current Assignee Address: JP Kyoto
- Agency: JCIPRNET
- Priority: JP 19130261 2019.07.12
- International Application: PCT/JP2020/026951 2020.07.10
- International Announcement: WO2021/010302A 2021.01.21
- Date entered country: 2022-01-10
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H05H1/46

Abstract:
The present invention comprises: a high-frequency power supply; an antenna group having a plurality of antennas connected to the high-frequency power supply; a plurality of reactance variable elements connected to the feeding sides and the grounding sides of the plurality of antennas; a current detection mechanism which detects the current flowing through the feeding sides and the ground sides of the plurality of antennas; a uniformity calculation unit which calculates the uniformity index value of the current flowing through the plurality of antennas, on the basis of the current value detected by the current detection mechanism; and a reactance changing unit which sequentially changes the reactance of the plurality of reactance variable elements such that the uniformity index value calculated by the uniformity calculation unit approaches a predetermined set value.
Public/Granted literature
- US20220277930A1 PLASMA CONTROL SYSTEM AND PLASMA CONTROL PROGRAM Public/Granted day:2022-09-01
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