Invention Grant
- Patent Title: Spin diode devices
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Application No.: US17134582Application Date: 2020-12-28
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Publication No.: US11751483B2Publication Date: 2023-09-05
- Inventor: Wai Cheung Law , Grayson Dao Hwee Wong , Kazutaka Yamane , Chim Seng Seet , Wen Siang Lew
- Applicant: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Current Assignee: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: VIERING JENTSCHURA & PARTNER MBB
- Main IPC: H10N50/10
- IPC: H10N50/10 ; H01F10/32 ; H03B15/00 ; H03D1/10 ; H10N50/80 ; H10N50/85

Abstract:
According to various embodiments, a spin diode device may include a magnetic tunnel junction stack. The magnetic tunnel junction stack may include a lower magnetic layer, a tunnel barrier layer over the lower magnetic layer, and an upper magnetic layer over the tunnel barrier layer. The lower magnetic layer may include a lower magnetic film. The tunnel barrier layer comprising an insulating material. The upper magnetic layer may include an upper magnetic film. Each of the lower magnetic film and the upper magnetic film may have perpendicular magnetic anisotropy.
Public/Granted literature
- US20220209102A1 SPIN DIODE DEVICES Public/Granted day:2022-06-30
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