Invention Grant
- Patent Title: Transparent refraction structure for an image sensor and methods of forming the same
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Application No.: US17232175Application Date: 2021-04-16
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Publication No.: US11749700B2Publication Date: 2023-09-05
- Inventor: Ming-Shiang Lin , Yun-Hao Chen , Kuo-Yu Wu , Tse-Hua Lu
- Applicant: Taiwan Semiconductor Manufacturing Company Limited
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee Address: TW Hsinchu
- Agency: The Marbury Law Group, PLLC
- Main IPC: H01L27/146
- IPC: H01L27/146

Abstract:
A plurality of photovoltaic junctions for a subpixel may be formed in a semiconductor substrate. After thinning the backside of the semiconductor substrate, at least one transparent refraction structure may be formed on the backside surface of the thinned semiconductor substrate. Each transparent refraction structure has a variable thickness that decreases with a lateral distance from a vertical axis passing through a geometrical center of the second-conductivity-type pillar structures for the subpixel. A subpixel optics assembly including an optical lens may be formed over the at least one transparent refraction structure. Each transparent refraction structure may reduce the tilt angle of light that propagate downward into the photodetectors, and increases total internal reflection of light and increase the efficiency of the photodetectors.
Public/Granted literature
- US20210375970A1 TRANSPARENT REFRACTION STRUCTURE FOR AN IMAGE SENSOR AND METHODS OF FORMING THE SAME Public/Granted day:2021-12-02
Information query
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