Invention Grant
- Patent Title: Magnetoresistance effect element and method for manufacturing the same
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Application No.: US17168579Application Date: 2021-02-05
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Publication No.: US11696513B2Publication Date: 2023-07-04
- Inventor: Katsuyuki Nakada , Shinto Ichikawa
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP 17138383 2017.07.14
- The original application number of the division: US16025171 2018.07.02
- Main IPC: H01L43/12
- IPC: H01L43/12 ; H01L43/08 ; H01L43/10 ; H10N50/80 ; H10N50/01 ; H10N50/10 ; H10N50/85

Abstract:
This magnetoresistance effect element includes a first ferromagnetic layer, a second ferromagnetic layer, and a tunnel barrier layer which is interposed between the first and second ferromagnetic layers, wherein the tunnel barrier layer has a spinel structure represented by a compositional formula X1-αYαOβ, and the tunnel barrier layer contains one or more additional elements selected from the group consisting of He, Ne, Ar, Kr, Xe, P, C, B, and Si, and in the compositional formula, X represents one or more elements selected from the group consisting of Mg, Zn, Cd, Ag, Pt, and Pb, Y represents one or more elements selected from the group consisting of Al, Ga, and In, a range of α is 0
Public/Granted literature
- US20210159396A1 MAGNETORESISTANCE EFFECT ELEMENT AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2021-05-27
Information query
IPC分类: