A plasma confinement system includes an enclosure, one or more internal magnetic coils suspended within the enclosure in a plasma region, and one or more supports configured to support the one or more internal magnetic coils suspended within the enclosure. Each support of the one or more supports includes a first end and a second end opposite the first end. The first end is coupled to an interior portion of the enclosure and the second end is coupled to a component disposed within the plasma region. Each support further includes electrical conducting material disposed between the first end and the second end. The electrical conducting material is configured to, when supplied with one or more electrical currents, generate a magnetic field having a magnetic field gradient that varies along the support from the first end to the second end.