Invention Grant
- Patent Title: Opto-electronic device having junction field-effect transistor structure and method of manufacturing the same
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Application No.: US16919328Application Date: 2020-07-02
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Publication No.: US11670665B2Publication Date: 2023-06-06
- Inventor: Kyungsang Cho , Hojung Kim , Chanwook Baik
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR 20200014354 2020.02.06
- Main IPC: H01L27/146
- IPC: H01L27/146 ; H01L31/0352 ; H01L31/112

Abstract:
Provided are opto-electronic devices with low dark noise and high signal-to-noise ratio and methods of manufacturing the same. An opto-electronic device may include: a semiconductor substrate; a light receiving unit formed in the semiconductor substrate; and a driving circuit arranged on a surface of the semiconductor substrate. The light receiving unit may include: a first semiconductor layer partially arranged in an upper region of the semiconductor substrate and doped with a first conductivity type impurity; a second semiconductor layer arranged on the first semiconductor layer and doped with a second conductivity type impurity; a transparent matrix layer arranged on an upper surface of the second semiconductor layer; a plurality of quantum dots arranged to contact the transparent matrix layer; and a first electrode and a second electrode electrically connected to the second semiconductor layer and respectively arranged on both sides of the transparent matrix layer.
Public/Granted literature
Information query
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