Invention Grant
- Patent Title: Photolithography device and method for monitoring position of a light source in a photolithography device
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Application No.: US17593054Application Date: 2021-04-16
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Publication No.: US11669015B2Publication Date: 2023-06-06
- Inventor: Xueyu Liang
- Applicant: CHANGXIN MEMORY TECHNOLOGIES, INC.
- Applicant Address: CN Hefei
- Assignee: CHANGXIN MEMORY TECHNOLOGIES, INC.
- Current Assignee: CHANGXIN MEMORY TECHNOLOGIES, INC.
- Current Assignee Address: CN Hefei
- Agency: Syncoda LLC
- Agent Feng Ma
- Priority: CN 2010420407.5 2020.05.18
- International Application: PCT/CN2021/087799 2021.04.16
- International Announcement: WO2021/233033A 2021.11.25
- Date entered country: 2021-09-07
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/683
Abstract:
A photolithography device includes: a fixed slot, configured to install and fix the light source; a sensing module, configured to sense the distance information between the light source and the fixed slot; a prompt module, configured to send prompt information according to the distance information; and a determination module, configured to determine the installation status of the light source according to the prompt information.
Public/Granted literature
Information query
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