Invention Grant
- Patent Title: Color filter substrate and fabricating method thereof
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Application No.: US16627357Application Date: 2019-11-28
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Publication No.: US11647660B2Publication Date: 2023-05-09
- Inventor: Liangfen Zhang
- Applicant: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Applicant Address: CN Shenzhen
- Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Guangdong
- Agency: PV IP PC
- Agent Wei Te Chung; Ude Lu
- Priority: CN 1911118797.4 2019.11.15
- International Application: PCT/CN2019/121430 2019.11.28
- International Announcement: WO2021/093028A 2021.05.20
- Date entered country: 2019-12-30
- Main IPC: H01L27/32
- IPC: H01L27/32 ; G02B5/20 ; H01L51/52 ; H01L51/56

Abstract:
A color filter substrate and a fabricating method thereof are provided. The color filter substrate has a pixel definition layer having a first pixel-defining structure and a second pixel-defining structure, and the second pixel-defining structure encapsulates the first pixel-defining structure. The pixel definition layer enhances its structural support strength while ensuring its own shading property and hydrophobicity, so that it can reach a target height, and an undercut phenomenon is less likely to occur.
Public/Granted literature
- US20210359008A1 COLOR FILTER SUBSTRATE AND FABRICATING METHOD THEREOF Public/Granted day:2021-11-18
Information query
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