Invention Grant
- Patent Title: Semiconductor laser shaping device
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Application No.: US16795430Application Date: 2020-02-19
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Publication No.: US11644681B2Publication Date: 2023-05-09
- Inventor: Shaofeng Zhang , Guanglei Ding , Jianyang Yang , Haocheng Hu , Huaping Zhang , Yawei Yan , Renliang Wan
- Applicant: Fujian Hitronics Technologies, Inc.
- Applicant Address: CN Fuzhou
- Assignee: Fujian Hitronics Technologies, Inc.
- Current Assignee: Fujian Hitronics Technologies, Inc.
- Current Assignee Address: CN Fuzhou
- Agency: SV Patent Service
- Main IPC: G02B27/09
- IPC: G02B27/09 ; G02B27/28 ; G02B27/30 ; H01S5/00 ; G02B5/04

Abstract:
A semiconductor laser shaping device includes, along the light path of a semiconductor laser, a fast axis collimating lens, slow axis collimating lens, the half wave plate, a polarization beam combining prism, and a crawling prism group. The laser emitted by the semiconductor laser is collimated by a fast-axis collimating lens and then by a slow-axis collimating lens, and subsequently injected into a half wave plate and polarization beam combining prism, which compresses its spot size along the slow axis while keeping the spot size unchanged along the fast axis. The laser beam then passes through the crawling prism group, which shifts a portion of the light in the slow-axis direction to the fast-axis direction, which again compresses the light beam in the slow-axis direction. The device can reduce the beam size of a semiconductor laser in the slow-axis direction, reducing its beam parameter product and improving beam quality.
Public/Granted literature
- US20210255467A1 Semiconductor laser shaping device Public/Granted day:2021-08-19
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