Invention Grant
- Patent Title: Systems and methods for controlling substrate approach toward a target horizontal plane
-
Application No.: US16819004Application Date: 2020-03-13
-
Publication No.: US11621187B2Publication Date: 2023-04-04
- Inventor: Douglas Hill , Cian Sweeney , Manish Ranjan
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Penilla IP, APC
- Main IPC: H01L21/687
- IPC: H01L21/687 ; C25D17/00 ; C25D21/12 ; H01L21/67 ; C25D17/06

Abstract:
A determination is made of a real-time azimuthal position of a notch alignment feature located on a support surface of a substrate holder relative to a fixed reference ray extending perpendicularly away from a rotational axis of the substrate holder as the substrate holder rotates about the rotational axis. A determination is made of an approach initiation azimuthal position of the notch alignment feature relative to the fixed reference ray at which vertical movement of the substrate holder should initiate in order to have the notch alignment feature located at a prescribed azimuthal position relative to the fixed reference ray when the substrate holder reaches a prescribed vertical position. A determination is made of a time delay required to have the notch alignment feature located at the approach initiation azimuthal position. Vertical movement of the substrate holder is initiated in accordance with the determined time delay.
Public/Granted literature
- US20200219754A1 Systems and Methods for Controlling Substrate Approach Toward a Target Horizontal Plane Public/Granted day:2020-07-09
Information query
IPC分类: