Invention Grant
- Patent Title: Magnetoresistance effect element
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Application No.: US17333268Application Date: 2021-05-28
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Publication No.: US11600771B2Publication Date: 2023-03-07
- Inventor: Tomoyuki Sasaki , Katsuyuki Nakada , Tatsuo Shibata
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2015-071412 20150331
- Main IPC: H01L43/10
- IPC: H01L43/10 ; H01L43/08 ; H01L27/105 ; H01L29/82 ; G01R33/09 ; G11B5/39 ; G11C11/16 ; H01L27/22

Abstract:
A magnetoresistance effect element has an underlayer, a first ferromagnetic metal layer, a second ferromagnetic metal layer, and a tunnel barrier layer that is sandwiched between the first and second ferromagnetic metal layers. The tunnel barrier layer has a spinel structure and includes at least one lattice-matched portion, and at least one lattice-mismatched portion. The underlayer is made of a nitride layer; a layer having a (001)-oriented tetragonal or cubic structure; or a layer having a stacked structure with a combination of a nitride layer having a (001)-oriented NaCl structure and a layer having a (001)-oriented tetragonal or cubic structure.
Public/Granted literature
- US20210328136A1 MAGNETORESISTANCE EFFECT ELEMENT Public/Granted day:2021-10-21
Information query
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