Invention Grant
- Patent Title: Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process
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Application No.: US17121603Application Date: 2020-12-14
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Publication No.: US11600477B2Publication Date: 2023-03-07
- Inventor: Kirankumar Neelasandra Savandaiah , Shane Lavan , Sundarapandian Ramalinga Vijayalakshmi Reddy , Randal Dean Schmieding , Yong Cao
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Main IPC: H01J37/34
- IPC: H01J37/34 ; H01J37/32 ; C23C14/35 ; C23C14/28 ; C23C14/56

Abstract:
Embodiments of process shield for use in process chambers are provided herein. In some embodiments, a process shield for use in a process chamber includes: an annular body having an upper portion and a lower portion extending downward and radially inward from the upper portion, wherein the upper portion includes a plurality of annular trenches on an upper surface thereof and having a plurality of slots disposed therebetween to fluidly couple the plurality of annular trenches, wherein one or more inlets extend from an outer surface of the annular body to an outermost trench of the plurality of annular trenches.
Public/Granted literature
- US20220186361A1 GAS INJECTION PROCESS KIT TO ELIMINATE ARCING AND IMPROVE UNIFORM GAS DISTRIBUTION FOR A PVD PROCESS Public/Granted day:2022-06-16
Information query