Invention Grant
- Patent Title: Impedance adjustment device
-
Application No.: US17123645Application Date: 2020-12-16
-
Publication No.: US11545954B2Publication Date: 2023-01-03
- Inventor: Tatsuya Morii
- Applicant: DAIHEN Corporation
- Applicant Address: JP Osaka
- Assignee: DAIHEN Corporation
- Current Assignee: DAIHEN Corporation
- Current Assignee Address: JP Osaka
- Agency: Bozicevic, Field & Francis LLP
- Agent Bret E. Field
- Priority: JPJP2019-238645 20191227
- Main IPC: H03H7/40
- IPC: H03H7/40 ; H03H7/00

Abstract:
An impedance adjustment device includes a variable capacitor unit. A microcomputer changes the capacitance value of the variable capacitor unit by switching PIN diodes included in n capacitor circuits on or off separately. Thus, the impedance on the plasma generator side when viewed from a high frequency power supply is adjusted. When changing the capacitance value of the variable capacitor unit to a target capacitance value, the microcomputer changes the capacitance value. When a predetermined period passes after the change of the capacitance value, the microcomputer changes the capacitance value again.
Public/Granted literature
- US20210203301A1 Impedance Adjustment Device Public/Granted day:2021-07-01
Information query