Invention Grant
- Patent Title: Rotor magnet installation structure and rotor magnet installation method
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Application No.: US16922128Application Date: 2020-07-07
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Publication No.: US11545862B2Publication Date: 2023-01-03
- Inventor: Ki Hoon Park
- Applicant: HANWHA POWER SYSTEMS CO., LTD
- Applicant Address: KR Changwon-si
- Assignee: HANWHA POWER SYSTEMS CO., LTD
- Current Assignee: HANWHA POWER SYSTEMS CO., LTD
- Current Assignee Address: KR Changwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2020-0008746 20200122
- Main IPC: H02K1/30
- IPC: H02K1/30 ; H02K1/27 ; H02K15/12 ; H02K15/03 ; H02K1/2726

Abstract:
A rotor magnet installation structure includes: a first shaft including a shrinkage-fit portion in which an accommodation space is formed; at least one magnet inserted in the accommodation space, an installation outer diameter of the magnet being greater than an inner diameter of the accommodation space before the magnet is inserted in the accommodation space; and a second shaft comprising a connection portion inserted in the accommodation space, an outer diameter of the connection portion being greater than the inner diameter of the accommodation space before the connection portion is inserted in the accommodation space.
Public/Granted literature
- US20210226495A1 ROTOR MAGNET INSTALLATION STRUCTURE AND ROTOR MAGNET INSTALLATION METHOD Public/Granted day:2021-07-22
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