- Patent Title: Photosensor device and method of manufacturing a photosensor device
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Application No.: US17516744Application Date: 2021-11-02
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Publication No.: US11545592B2Publication Date: 2023-01-03
- Inventor: Masaaki Norimatsu , Daiyu Kondo
- Applicant: FUJITSU LIMITED
- Applicant Address: JP Kawasaki
- Assignee: FUJITSU LIMITED
- Current Assignee: FUJITSU LIMITED
- Current Assignee Address: JP Kawasaki
- Agency: Fujitsu Patent Center
- Priority: JPJP2021-001497 20210107
- Main IPC: H01L31/112
- IPC: H01L31/112 ; H01L31/028 ; H01L31/18 ; H01L31/0216 ; H01L31/0352

Abstract:
A photosensor device includes a substrate, a graphene layer provided on the substrate, a pair of electrodes electrically connected to the graphene layer, and a passivation layer formed of a resin and configured to cover the graphene layer. The graphene layer has holes which are periodically arranged, and the passivation layer is provided with openings that communicate with the holes. The side surfaces of the holes and the inner walls of the openings are continuously covered with an insulating thin film.
Public/Granted literature
- US20220216360A1 PHOTOSENSOR DEVICE AND METHOD OF MANUFACTURING A PHOTOSENSOR DEVICE Public/Granted day:2022-07-07
Information query
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