Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
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Application No.: US17004345Application Date: 2020-08-27
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Publication No.: US11545437B2Publication Date: 2023-01-03
- Inventor: Takashi Watanabe , Yasuhito Yoshimizu
- Applicant: Kioxia Corporation
- Applicant Address: JP Minato-ku
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPJP2019-163301 20190906
- Main IPC: H01L27/11548
- IPC: H01L27/11548 ; H01L27/11575 ; H01L23/538 ; H01L27/11556 ; G11C5/02 ; H01L21/768 ; H01L27/11582

Abstract:
A semiconductor device according to one embodiment includes a substrate, a stacked body including conductive layers and insulating layers alternately stacked on the substrate, and first contact plugs individually connected to the conductive layers on an end of the stacked body. The semiconductor device includes, on the substrate, a lower layer three-dimensional structure including any of a lower layer inclined structure continuously inclined upward with respect to a flat surface of the substrate, a lower layer stepped structure inclined upward in a stepwise manner with respect to the flat surface, and a lower layer composite stepped structure in which planes parallel to the flat surface and slopes inclined upward with respect to the flat surface are alternately continuous. At least some of terrace regions being connection regions to the first contact plugs on top surfaces of the conductive layers are located on the lower layer three-dimensional structure.
Public/Granted literature
- US20210074643A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2021-03-11
Information query
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