Invention Grant
- Patent Title: Techniques for wafer stack processing
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Application No.: US17406249Application Date: 2021-08-19
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Publication No.: US11545395B2Publication Date: 2023-01-03
- Inventor: Yung-Lung Lin , Cheng-Hsien Chou , Cheng-Yuan Tsai , Kuo-Ming Wu , Hau-Yi Hsiao
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: H01L21/822
- IPC: H01L21/822 ; H01L21/304 ; H01L29/06 ; H01L27/06

Abstract:
The present disclosure, in some embodiments, relates to a multi-dimensional integrated chip structure. The multi-dimensional integrated chip structure includes a first substrate having a first upper surface and a second upper surface above the first upper surface. A first outermost perimeter of the first upper surface is larger than a second outermost perimeter of the second upper surface. A second substrate is over the first substrate. The second substrate has a third upper surface above the second upper surface. A third outermost perimeter of the third upper surface is smaller than the second outermost perimeter of the second upper surface.
Public/Granted literature
- US20210384078A1 TECHNIQUES FOR WAFER STACK PROCESSING Public/Granted day:2021-12-09
Information query
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