Invention Grant
- Patent Title: Semiconductor device having planarized passivation layer and method of fabricating the same
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Application No.: US17071137Application Date: 2020-10-15
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Publication No.: US11488894B2Publication Date: 2022-11-01
- Inventor: Young Lyong Kim , Seungduk Baek
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Volentine, Whitt & Francos, PLLC
- Priority: KR10-2018-0015706 20180208
- Main IPC: H01L23/488
- IPC: H01L23/488 ; H01L23/538 ; H01L23/00

Abstract:
A semiconductor device includes a semiconductor substrate divided into a pad region and a cell region and having an active surface and an inactive surface opposite to the active surface, a plurality of metal lines on the active surface of the semiconductor substrate, passivation layers on the active surface of the semiconductor substrate, and a plurality of bumps in the cell region. The passivation layers include a first passivation layer covering the plurality of metal lines and having a non-planarized top surface along an arrangement profile of the plurality of metal lines, and a second passivation layer on the non-planarized top surface of the first passivation layer and having a planarized top surface on which the plurality of bumps are disposed.
Public/Granted literature
- US20210028092A1 SEMICONDUCTOR DEVICE HAVING PLANARIZED PASSIVATION LAYER AND METHOD OF FABRICATING THE SAME Public/Granted day:2021-01-28
Information query
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