Invention Grant
- Patent Title: Resistive memory device and method of manufacturing the same and electronic device
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Application No.: US16701293Application Date: 2019-12-03
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Publication No.: US11444242B2Publication Date: 2022-09-13
- Inventor: Kwanghee Kim , Heejae Lee , Oul Cho , Tae Hyung Kim , Eun Joo Jang
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Cantor Colburn LLP
- Priority: KR10-2019-0053613 20190508
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L27/24

Abstract:
A resistive memory device including a first electrode and a second electrode facing each other and a variable resistance layer disposed between the first electrode and the second electrode, wherein the variable resistance layer includes cadmium-free quantum dots (Cd-free quantum dots) and at least a portion of the Cd-free quantum dots include a Cd-free quantum dot including a halide anion on a surface of the Cd-free quantum dot, a method of manufacturing the same and an electronic device.
Information query
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