A non-volatile memory device is provided. The non-volatile memory device comprises a semiconductor channel layer, a tunneling layer, a charge trap layer, and a blocking insulating layer arranged in sequence. A plurality of control gate electrodes are disposed on the blocking insulating layer. An inter-cell insulating layer is disposed between the control gate electrodes. A spacer insulating film is disposed between the control gate electrode and the inter-cell insulating layer, and the spacer insulating film has a lower dielectric constant than the inter-cell insulating layer. The charge trap layer extends under the plurality of control gate electrodes and is disposed under the inter-cell insulating layer and the spacer insulating film.