Invention Grant
- Patent Title: Semiconductor device and method for manufacturing the same
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Application No.: US17013986Application Date: 2020-09-08
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Publication No.: US11444189B2Publication Date: 2022-09-13
- Inventor: Jumpei Tajima , Toshiki Hikosaka , Shinya Nunoue
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPJP2019-225145 20191213,JPJP2020-148004 20200903
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/205 ; H01L29/66 ; H01L29/207 ; H01L29/20 ; H01L29/423

Abstract:
According to one embodiment, a semiconductor device includes first, second, and third electrodes, first, second, and third semiconductor layers, and a first insulating member. The first semiconductor layer includes first, second, third, fourth, and fifth partial regions. A direction from the first partial region toward the second partial region is along a first direction. The first electrode includes a first electrode portion. A direction from the first electrode portion toward the second electrode is along the first direction. A second direction from the third partial region toward the third electrode crosses the first direction. The second semiconductor layer includes a first semiconductor portion and a second semiconductor portion. At least a portion of the first semiconductor layer is between the third and second semiconductor layers. The first insulating member includes a first insulating portion. The first insulating portion is provided between the third partial region and the third electrode.
Public/Granted literature
- US20210184026A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2021-06-17
Information query
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