Invention Grant
- Patent Title: Negative differential resistance element having 3-dimension vertical structure
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Application No.: US16871284Application Date: 2020-05-11
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Publication No.: US11437572B2Publication Date: 2022-09-06
- Inventor: Jin Hong Park , Kil Su Jung , Keun Heo
- Applicant: Research & Business Foundation Sungkyunkwan University
- Applicant Address: KR Suwon-si
- Assignee: Research & Business Foundation Sungkyunkwan University
- Current Assignee: Research & Business Foundation Sungkyunkwan University
- Current Assignee Address: KR Suwon-si
- Agency: NSIP Law
- Priority: KR10-2019-0054471 20190509
- Main IPC: H01L47/00
- IPC: H01L47/00 ; H01L45/00 ; H01L27/24

Abstract:
Provided is a negative differential resistance element having a 3-dimension vertical structure. The negative differential resistance element having a 3-dimension vertical structure includes: a substrate; a first electrode that is formed on the substrate to receive a current; a second semiconductor material that is formed in some region of the substrate; a first semiconductor material that is deposited in some other region and the first electrode of the substrate and some region of an upper end of the second semiconductor material; an insulator that has a part vertically erected from the substrate, the other part vertically erected from the second semiconductor material, and an upper portion stacked with a first semiconductor material; and a second electrode that is formed at an upper end of the second semiconductor material to output a current, thereby significantly reducing an area of the device and greatly improving device scaling and integration.
Information query
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