- Patent Title: Integrated assemblies and methods of forming integrated assemblies
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Application No.: US16811118Application Date: 2020-03-06
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Publication No.: US11437389B2Publication Date: 2022-09-06
- Inventor: Shuangqiang Luo
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John P.S.
- Main IPC: H01L27/11556
- IPC: H01L27/11556 ; G11C5/06 ; G11C5/02 ; H01L27/11582

Abstract:
Some embodiments include an integrated assembly having a memory array region which includes channel material pillars extending through a stack of alternating conductive and insulative levels. A second region is adjacent the memory array region. A conductive expanse is within the memory array region and electrically coupled with the channel material of the channel material pillars. A panel extends across the memory array region and the second region. The panel separates one memory block region from another. The panel has a first portion over the conductive expanse, and has a second portion adjacent the first portion. The panel has a bottom surface. A first segment of the bottom surface is adjacent an upper surface of the conductive expanse. A segment of the bottom surface within the second portion is elevationally offset relative to the first segment. Some embodiments include methods of forming integrated assemblies.
Public/Granted literature
- US20210280597A1 Integrated Assemblies and Methods of Forming Integrated Assemblies Public/Granted day:2021-09-09
Information query
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