A portion of a source electrode exposed by an opening in a passivation film is used as a portion of a source pad. A first portion of the source pad includes a plating film formed by a material that is harder than a material of the source electrode. During screening, a probe needle that is a metal contact contacts the plating film that is on the first portion of the source pad. A second portion of the source pad has a layer structure different from that of the first portion of the source pad and in a second direction parallel to the front surface of the semiconductor chip, is disposed adjacently to and electrically connected to the first portion of the source pad. A bonding wire is wire bonded to the second portion of the source pad after an inspection process of the semiconductor chip.