Invention Grant
- Patent Title: Methods for growing a single crystal silicon ingot using continuous Czochralski method
-
Application No.: US16847760Application Date: 2020-04-14
-
Publication No.: US11408090B2Publication Date: 2022-08-09
- Inventor: Carissima Marie Hudson , JaeWoo Ryu
- Applicant: GlobalWafers Co., Ltd.
- Applicant Address: TW Hsinshu
- Assignee: GlobalWafers Co., Ltd.
- Current Assignee: GlobalWafers Co., Ltd.
- Current Assignee Address: TW Hsinshu
- Agency: Armstrong Teasdale LLP
- Main IPC: C30B15/02
- IPC: C30B15/02 ; C30B29/06 ; C30B15/00 ; C30B15/10 ; C30B15/14 ; C30B15/36

Abstract:
A method for growing a single crystal silicon ingot by the continuous Czochralski method is disclosed. The melt depth and thermal conditions are constant during growth because the silicon melt is continuously replenished as it is consumed, and the crucible location is fixed. The critical v/G is determined by the hot zone configuration, and the continuous replenishment of silicon to the melt during growth enables growth of the ingot at a constant pull rate consistent with the critical v/G during growth of a substantial portion of the main body of the ingot.
Public/Granted literature
- US20200332439A1 METHODS FOR GROWING A SINGLE CRYSTAL SILICON INGOT USING CONTINUOUS CZOCHRALSKI METHOD Public/Granted day:2020-10-22
Information query
IPC分类: