Invention Grant
- Patent Title: Residual monomer content controlling method of polymer
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Application No.: US16335576Application Date: 2017-09-22
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Publication No.: US11407845B2Publication Date: 2022-08-09
- Inventor: Yong Joon Choi , Won Chan Park
- Applicant: LG Chem, Ltd.
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: Morgan, Lewis & Bockius LLP
- Priority: KR10-2016-0121802 20160923
- International Application: PCT/KR2017/010490 WO 20170922
- International Announcement: WO2018/056758 WO 20180329
- Main IPC: C08F6/00
- IPC: C08F6/00 ; C08L55/02 ; F26B3/06 ; F26B3/08 ; F26B21/06
Abstract:
A method for controlling a residual monomer content of a polymer, wherein when a hot-air temperature and a hot-air velocity are maintained, the controlling method can predict the content of the residual monomer by controlling a hot-air mass ratio without influence of other external factors.
Public/Granted literature
- US20200017612A1 A Residual Monomer Content Controlling Method Of Polymer Public/Granted day:2020-01-16
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