Invention Grant
- Patent Title: Methods of making semiconductor radiation detector
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Application No.: US17039059Application Date: 2020-09-30
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Publication No.: US11380812B2Publication Date: 2022-07-05
- Inventor: Peiyan Cao , Yurun Liu
- Applicant: SHENZHEN XPECTVISION TECHNOLOGY CO., LTD.
- Applicant Address: CN Shenzhen
- Assignee: SHENZHEN XPECTVISION TECHNOLOGY CO., LTD.
- Current Assignee: SHENZHEN XPECTVISION TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Shenzhen
- Agency: IPro, PLLC
- Agent Qian Gu
- Main IPC: H01L31/00
- IPC: H01L31/00 ; H01L31/18 ; A61B6/03 ; A61B6/14 ; G01T1/24 ; H01J37/244 ; H01L27/146 ; H01L31/02 ; H01L31/0224 ; H01L31/0296 ; H01L31/08 ; A61B6/00 ; H01J37/26

Abstract:
Disclosed herein is an apparatus and a method of making the apparatus. The method comprises obtaining a plurality of semiconductor single crystal chunks. Each of the plurality of semiconductor single crystal chunks may have a first surface and a second surface. The second surface may be opposite to the first surface. The method may further comprise bonding the plurality of semiconductor single crystal chunks by respective first surfaces to a first semiconductor wafer. The plurality of semiconductor single crystal chunks forming a radiation absorption layer. The method may further comprise forming a plurality of electrodes on respective second surfaces of each of the plurality of semiconductor single crystal chunks, depositing pillars on each of the plurality of semiconductor single crystal chunks and bonding the plurality of semiconductor single crystal chunks to a second semiconductor wafer by the pillars.
Public/Granted literature
- US20210013362A1 METHODS OF MAKING SEMICONDUCTOR RADIATION DETECTOR Public/Granted day:2021-01-14
Information query
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