Invention Grant
- Patent Title: Semiconductor device including anti-fuse cell structure
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Application No.: US16533359Application Date: 2019-08-06
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Publication No.: US11380693B2Publication Date: 2022-07-05
- Inventor: Meng-Sheng Chang , Yao-Jen Yang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Hauptman Ham, LLP
- Main IPC: H01L27/112
- IPC: H01L27/112 ; H01L23/528 ; G11C17/16 ; G11C17/18 ; H01L23/525 ; G06F30/392

Abstract:
A structure includes a word line, a bit line, and an anti-fuse cell. The anti-fuse cell includes a reading device, a programming device, and a dummy device. The reading device includes a first gate coupled to the first word line, a first source/drain region coupled to the bit line, and a second source/drain region. The first source/drain region and the second source/drain region are on opposite sides of the first gate. The programming device includes a second gate, a third source/drain region coupled to the second source/drain region, and a fourth source/drain region. The third source/drain region and the fourth source/drain region are on opposite sides of the second gate. The dummy device includes a third gate, a fifth source/drain region coupled to the fourth source/drain region, and a sixth source/drain region. The fifth source/drain region and the sixth source/drain region are on opposite sides of the third gate.
Public/Granted literature
- US20200058660A1 SEMICONDUCTOR DEVICE INCLUDING ANTI-FUSE CELL STRUCTURE Public/Granted day:2020-02-20
Information query
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