Invention Grant
- Patent Title: Method for producing difluoromethylene compound
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Application No.: US17048760Application Date: 2019-04-25
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Publication No.: US11377407B2Publication Date: 2022-07-05
- Inventor: Tatsuya Ohtsuka , Yoshichika Kuroki , Atsushi Shirai , Moe Hosokawa , Yosuke Kishikawa
- Applicant: DAIKIN INDUSTRIES, LTD.
- Applicant Address: JP Osaka
- Assignee: DAIKIN INDUSTRIES, LTD.
- Current Assignee: DAIKIN INDUSTRIES, LTD.
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JPJP2018-084473 20180425
- International Application: PCT/JP2019/017575 WO 20190425
- International Announcement: WO2019/208682 WO 20191031
- Main IPC: C07C17/18
- IPC: C07C17/18 ; C07C17/32

Abstract:
The problem to be solved by the present invention is to provide a novel method for producing a difluoromethylene compound, in particular, a simple method for producing a difluoromethylene compound. This problem is solved by a method for producing a difluoromethylene compound (I) containing at least one —CF2— moiety, the method comprising step A of allowing IF5 and a disulfide compound (III) of the formula: RA—S—S—RA (wherein RA, in each occurrence, independently represents aryl optionally having at least one substituent or alkyl optionally having at least one substituent) to act on a carbonyl compound (II) containing at least one —C(O)— moiety.
Public/Granted literature
- US20210363077A1 METHOD FOR PRODUCING DIFLUOROMETHYLENE COMPOUND Public/Granted day:2021-11-25
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