Invention Grant
- Patent Title: Extreme ultraviolet mask with embedded absorber layer
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Application No.: US16877990Application Date: 2020-05-19
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Publication No.: US11366379B2Publication Date: 2022-06-21
- Inventor: Wen Xiao , Vibhu Jindal
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: G03F1/24
- IPC: G03F1/24
Abstract:
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer embedded in the multilayer stack of reflective layers.
Public/Granted literature
- US20200371431A1 EXTREME ULTRAVIOLET MASK WITH EMBEDDED ABSORBER LAYER Public/Granted day:2020-11-26
Information query
