Invention Grant
- Patent Title: Method for manufacturing memory device having spacer
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Application No.: US16413716Application Date: 2019-05-16
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Publication No.: US11296147B2Publication Date: 2022-04-05
- Inventor: Chieh-Fei Chiu , Yong-Shiuan Tsair , Wen-Ting Chu , Yu-Wen Liao , Chin-Yu Mei , Po-Hao Tseng
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McClure, Qualey & Rodack, LLP
- Main IPC: H01L27/24
- IPC: H01L27/24 ; H01L45/00

Abstract:
A memory device includes a first bottom electrode, a first memory stack, and a second memory stack. The first bottom electrode has a first portion and a second portion connected to the first portion. The first memory stack is over the first portion of the first bottom electrode. The first memory stack includes a first resistive switching element and a first top electrode over the first resistive switching element. The second memory stack is over the second portion of the first bottom electrode. The second memory stack comprises a second resistive switching element and a second top electrode over the second resistive switching element.
Information query
IPC分类: