Invention Grant
- Patent Title: Resin substrate and method for producing resin substrate
-
Application No.: US17137511Application Date: 2020-12-30
-
Publication No.: US11277919B2Publication Date: 2022-03-15
- Inventor: Shinichi Araki , Kunihiro Komaki
- Applicant: Murata Manufacturing Co., Ltd.
- Applicant Address: JP Nagaokakyo
- Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee Address: JP Nagaokakyo
- Agency: Keating & Bennett, LLP
- Priority: JPJP2018-143163 20180731
- Main IPC: H05K1/02
- IPC: H05K1/02 ; H05K3/28 ; H05K1/11

Abstract:
A resin substrate includes a resin base material including a first main surface, electrode pads provided on the first main surface, circuit conductor patterns, a resist film, and a coverlay film. The resist film includes, on the outer circumference, a plurality of protruding portions each of which has a tapered shape with a vertex. A portion of the circuit conductor patterns are covered with the resist film, and the coverlay film covers a portion of the resist film including the protruding portions and exposed portions of the circuit conductor patterns. The protruding portions are located at positions sandwiching the exposed portions of the circuit conductor patterns.
Public/Granted literature
- US20210120678A1 RESIN SUBSTRATE AND METHOD FOR PRODUCING RESIN SUBSTRATE Public/Granted day:2021-04-22
Information query