Invention Grant
- Patent Title: Stress mitigation structure
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Application No.: US16670564Application Date: 2019-10-31
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Publication No.: US11276650B2Publication Date: 2022-03-15
- Inventor: YongIk Choi , Chris Chung , Michael Leary , Domingo Figueredo , Chang Kyu Choi , Sarah Haney , Li Sun
- Applicant: Avago Technologies International Sales Pte. Limited
- Applicant Address: SG Singapore
- Assignee: Avago Technologies International Sales Pte. Limited
- Current Assignee: Avago Technologies International Sales Pte. Limited
- Current Assignee Address: SG Singapore
- Agency: Foley & Lardner LLP
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L23/13 ; H01L21/48 ; H01L23/498

Abstract:
A device and substrate are disclosed. An illustrative device includes a substrate having a first surface and an opposing second surface, a solder material receiving curved surface exposed at the second surface of the substrate, a solder resist material that at least partially covers the solder material receiving curved surface such that a middle portion of the solder receiving curved surface is exposed and such that an edge portion of the solder material receiving curved surface is covered by the solder resist material and forms an undercut, and a solder material disposed within the solder material receiving curved surface and within the undercut.
Public/Granted literature
- US20210134735A1 STRESS MITIGATION STRUCTURE Public/Granted day:2021-05-06
Information query
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