Invention Grant
- Patent Title: Apparatus with embedded fine line space in a cavity, and a method for forming the same
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Application No.: US16321420Application Date: 2016-09-02
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Publication No.: US11272619B2Publication Date: 2022-03-08
- Inventor: Kristof Darmawikarta , Robert A. May , Yikang Deng , Ji Yong Park , Maroun D. Moussallem , Amruthavalli P. Alur , Sri Ranga Sai Boyapati , Lilia May
- Applicant: INTEL CORPORATION
- Applicant Address: US CA Santa Clara
- Assignee: INTEL CORPORATION
- Current Assignee: INTEL CORPORATION
- Current Assignee Address: US CA Santa Clara
- Agency: Essential Patents Group, LLP.
- International Application: PCT/US2016/050268 WO 20160902
- International Announcement: WO2018/044326 WO 20180308
- Main IPC: H05K1/18
- IPC: H05K1/18 ; H05K3/42 ; H01L21/60 ; H01L27/146 ; G01J5/20 ; H05K1/11 ; H05K3/46

Abstract:
An apparatus is provided which comprises: a cavity made in a substrate of a printed circuit board (PCB); a plurality of solder balls embedded in the cavity; and a horizontal trace within the substrate, wherein the horizontal trace is partially directly under the plurality of solder balls and is coupled to the plurality of solder balls and another trace or via in the substrate such that a substrate region under the plurality of solder balls is independent of a stop layer under the cavity.
Public/Granted literature
- US20210307172A1 AN APPARATUS WITH EMBEDDED FINE LINE SPACE IN A CAVITY, AND A METHOD FOR FORMING THE SAME Public/Granted day:2021-09-30
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