Invention Grant
- Patent Title: Power semiconductor device and manufacturing method thereof, and power conversion device
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Application No.: US16442755Application Date: 2019-06-17
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Publication No.: US11271352B2Publication Date: 2022-03-08
- Inventor: Yoshiaki Takewaki , Yoshihisa Uchida , Yo Tanaka
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: JPJP2018-148968 20180808
- Main IPC: H01R43/02
- IPC: H01R43/02 ; H01L23/498 ; H01R12/51 ; H01R4/02 ; H02M7/5387 ; H05K1/18 ; H05K1/09 ; H05K3/32 ; H02M1/08 ; H01L29/739

Abstract:
The object is to provide a technology capable of increasing the reliability of a power semiconductor device. A power semiconductor device includes: a substrate including an insulating layer and a circuit pattern that are disposed in this order; a power semiconductor element electrically connected to the circuit pattern; and an electrode terminal having a thinned portion including a welded portion welded to the circuit pattern by a fiber laser. A thickness of the circuit pattern is not less than 0.2 and not more than 0.5 mm, and a thickness of the thinned portion of the electrode terminal is not less than one time and not more than two times the thickness of the circuit pattern.
Public/Granted literature
- US20200052449A1 POWER SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF, AND POWER CONVERSION DEVICE Public/Granted day:2020-02-13
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