Invention Grant
- Patent Title: Modified repair solution, preparation method thereof, and method for repairing color resist
-
Application No.: US16627297Application Date: 2019-11-12
-
Publication No.: US11271093B2Publication Date: 2022-03-08
- Inventor: Can Peng
- Applicant: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Shenzhen
- Assignee: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Shenzhen
- International Application: PCT/CN2019/117457 WO 20191112
- International Announcement: WO2021/012505 WO 20210128
- Main IPC: H01L29/66
- IPC: H01L29/66 ; C09D7/63 ; C09D5/08

Abstract:
The present invention provides a modified repair solution, a preparation method thereof, and a method for repairing color resist. Through adding additives to a photoresist solvent, a ketone compound in the modified repair solution is adsorbed on a surface of a source/drain metal layer to chemically react with a molecular linker to form a transparent colloid. The colloid is colorless and transparent, insoluble in water and organic solvent, and has strong adsorption with aluminum. After the transparent colloid is formed, further formation of the colloid is prevented, and aluminum is prevented from contacting with alkaline modified repair chemical solution, thereby preventing aluminum from being corroded; moreover, the chemical solution can be prevented from remaining in a damaged portion of a protective layer, and reaction with aluminum at high temperatures in post processing can be prevented, thereby preventing a vertical disconnection.
Public/Granted literature
- US20210126111A1 MODIFIED REPAIR SOLUTION, PREPARATION METHOD THEREOF, AND METHOD FOR REPAIRING COLOR RESIST Public/Granted day:2021-04-29
Information query
IPC分类: